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| Name | Intel Adds ASML’s First High NA EUV Tool to Oregon Factory |
| Video Uploader | Video From Intel Newsroom |
| Upload Date | This Video Uploaded At 18-04-2024 10:00:26 |
| Video Discription | ASML’s High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography scanner sits in Intel Oregon’s D1X test manufacturing factory, where it is going through its final calibration. It is as big as a double-decker bus and weighs as much as a blue whale. It will shoot lasers at light speed and heat plasma to nearly 220,000 degrees Celsius, almost 40 times hotter than the surface temperature of the sun. The new TWINSCAN EXE: 5000 has the ability to dramatically improve resolution feature scaling for next-generation processors and will enable the continued pursuit of Moore’s Law. About Intel Newsroom Intel Newsroom brings you the latest news and updates on world-changing technology that enriches the lives of everyone on Earth. Catch up on the latest innovations in client computing, artificial intelligence, security, data centers, international news and more. Watch recaps and replays from industry events where Intel has a major role, such as Mobile World Congress (MWC), Intel Innovation, the Consumer Electronics Show (CES) and others. Connect with Intel Newsroom Subscribe now to Intel Newsroom on YouTube: https://www.youtube.com/channel/UCHJnltjgj0Y6xCxPzziHhHA Visit the Intel Newsroom: https://www.intel.com/content/www/us/en/newsroom/home.html Follow @IntelNews on Twitter: https://twitter.com/intelnews |
| Category | Science & Technology |
| Tags | Intel | Technology |
